Retractable probe system with in situ fabrication environment pr

Details Retractable probe system with in situ fabrication environment pr Retractable probe system with in situ fabrication environment pr

1994-06-02

1998-05-05

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

1566271, 216 59, C23C 1600

Patent

active

057468354

ABSTRACT:
A retractable probe system (12) senses in situ a plurality of predetermined process parameters of a wafer (24) fabrication environment (16) and includes a sensing device (47) for sensing the predetermined process parameters, a probe arm (46) for holding sensing device (47) and having sufficient length to extend sensing device (47) into a predetermined location of the fabrication environment (16). A housing (36) receives the sensing device (47) and probe arm (46). A locator mechanism (52, 42, and 44) controllably locates sensing device 47) and probe arm (46) within fabrication environment (16) and within housing (36). An isolator mechanism (34) isolates sensing device (47) and probe arm (46) within housing (36) and essentially out of gases communication with fabrication environment (16). Cleaning mechanism (54) cleanses sensing device (47) within housing (36) and permits sensing device (47) to be immediately thereafter located in fabrication environment (16).

REFERENCES:
patent: 4316791 (1982-02-01), Taillet
patent: 4668366 (1987-05-01), Zarowin
patent: 5082517 (1992-01-01), Moslehi
patent: 5159267 (1992-10-01), Anderson
patent: 5167748 (1992-12-01), Hall
patent: 5169407 (1992-12-01), Mase et al.
patent: 5433813 (1995-07-01), Kuwabara

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