Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent
1993-08-18
1996-07-23
Rodee, Christopher D.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
430 17, 430165, 430191, 430192, 430326, 430323, 428195, G03C 161, B32B 2718, B32B 310
Patent
active
055388205
ABSTRACT:
The invention provides a method for forming a photoresist mask on a substrate resistant to reticulation during plasma etching. The method comprises the steps of forming an imaged and developed photoresist coating over an integrated circuit substrate where the photoresist contains an essentially unreacted acid activated cross linking agent, and subjecting said substrate to an etching plasma in a gaseous stream that contains a Lewis acid. Contact of the surface of the photoresist film with the Lewis acid causes cross linking of the surface of the photoresist film during plasma etching with the formation of a reticulation resistant surface layer.
REFERENCES:
patent: 4259430 (1981-03-01), Kaplan et al.
patent: 4404272 (1983-09-01), Stahlhofer
patent: 4504574 (1985-03-01), Meyer et al.
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4600683 (1986-07-01), Greco et al.
patent: 4859563 (1989-08-01), Miura et al.
patent: 4863829 (1989-09-01), Furuta et al.
patent: 4906549 (1990-03-01), Asaumi et al.
patent: 4929536 (1990-05-01), Spak et al.
patent: 4948697 (1990-08-01), Durham
Photopolymerization of Surface Coatings, C. Roffey, John Wiley and Sons, Chichester, 1982, pp. 76-78.
Bergin, B. et al, IBM Technical Disclosure Bulletin, vol. 18, No. 5, Oct. 1975, p. 1395.
Batchelder, T. et al, Solid State Technology, vol. 26, 1983, pp. 211-217.
Allen, R. et al., Accelerated Brief Communications, Jun. 1982, pp. 1379-1381.
Journal of the Electrochemical Society, vol. 134, No. 8, pp. 2045-2048 (1987).
Goldberg Robert L.
Rodee Christopher D.
Shipley Company Inc.
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