Reticles with subdivided blocking regions

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C257S355000

Reexamination Certificate

active

08071262

ABSTRACT:
An attenuated phase shift reticle, or photomask, includes radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart sections with dimensions (e.g., surface area, etc.) that are configured to minimize or eliminate the buildup of electrostatic energy by the radiation blocking regions and/or the discharge of electrostatic energy from the radiation blocking regions and the damage that may be caused by such electrostatic discharge. The reticle may be configured to prevent radiation from passing through the cut lines between adjacent sections of a subdivided radiation blocking region. Methods for designing, fabricating, and using such masks are also disclosed, as are methods for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs.

REFERENCES:
patent: 5194345 (1993-03-01), Rolfson
patent: 5281500 (1994-01-01), Cathey et al.
patent: 5989754 (1999-11-01), Chen et al.
patent: 6238824 (2001-05-01), Futrell et al.
patent: 6421113 (2002-07-01), Armentrout
patent: 6447962 (2002-09-01), Yang
patent: 6569576 (2003-05-01), Hsueh et al.
patent: 6569584 (2003-05-01), Ho et al.
patent: 6893780 (2005-05-01), Galan et al.
patent: 7226708 (2007-06-01), Rolfson
patent: 7232629 (2007-06-01), Tu et al.
patent: 7419748 (2008-09-01), Ahn
patent: 2002/0009653 (2002-01-01), Kawada et al.
patent: 2002/0179852 (2002-12-01), Zheng et al.
patent: 2003/0013258 (2003-01-01), Lee
patent: 2004/0135986 (2004-07-01), Lee et al.
patent: 2005/0278046 (2005-12-01), Suttile et al.
patent: 2006/0122724 (2006-06-01), Croke et al.
patent: 2006/0154153 (2006-07-01), Chiang et al.
patent: 2006/0216614 (2006-09-01), Guo et al.
patent: 2006/0234137 (2006-10-01), Kim
patent: 2007/0218667 (2007-09-01), Rider
patent: 2007/0258061 (2007-11-01), Puerto et al.
patent: 2007/0266364 (2007-11-01), Pack et al.
patent: 143854 (2003-08-01), None
patent: 20030059477 (2003-07-01), None
patent: 0175943 (2001-10-01), None
Steinman, Best Practices for Applying Air Ionization, Electrical Overstress/Electrostatic Discharge Symposium Proceedings, Sep. 12, 1995, pp. 245-252.
Levit et al., Investigating Static-Charge Issues in Photolithography Areas, Facilities Technologies, Jun. 2000.
Wiley et al, Investigating a New Generation of ESD-Induced Reticle Defects, Ultrapure Materials—Reticles, Apr. 1999.
Bhattacharyya et al., Investigation of Reticle Defect Formation at DUV Lithography, IEEE/SEMI Advanced Manufacturing Conference, 2003. pp. 29-35.
Prevenslik, EFM and ESD in Photolithography by Cavity QED, IEEE, 2005, pp. 1103-1107.

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