Reticle with phase-shifters and a method of fabricating the same

Details Reticle with phase-shifters and a method of fabricating the same Reticle with phase-shifters and a method of fabricating the same

1993-10-19

1996-05-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430312, 430313, 430314, 1566431, 1566461, G03F 900

Patent

active

055144985

ABSTRACT:
A reticle and a method of fabricating the same for projecting a fine pattern on an object surface comprises: a transparent substrate; a first type phase-shifter selectively patterned and deposited on the substrate producing a phase difference between the light passing therethrough and the light passing through the other areas without phase-shifter; and a second type phase-shifter selectively patterned and forming a groove in the substrate producing a phase difference between the light passing therethrough and the light passing through the other areas without phase-shifter. The reticle may include a patterned shield layer which interrupts transmission of light, and the phase difference of the first and second type phase-shifters is many times selected substantially equal to a half wavelength of light. Another type of a reticle comprises: a transparent substrate; a phase-shifter of a first groove; and another phase-shifter of a second deeper groove formed in the first groove.

REFERENCES:
patent: 3547546 (1970-12-01), Schier
patent: 4530736 (1985-07-01), Mutter
patent: 4737447 (1988-04-01), Suzuki et al.
patent: 5045417 (1991-09-01), Okamoto

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