Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-12-04
1999-03-30
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 30, G03F 900, G03C 500
Patent
active
058886753
ABSTRACT:
A reticle provides an image pattern and compensates for a lens error in a photolithographic system. The reticle is structurally modified using image displacement data indicative of the lens error. The reticle can be structurally modified by adjusting the configuration (or layout) of radiation-transmitting regions, for instance by adjusting a chrome pattern on the top surface of a quartz base. Alternatively, the reticle can be structurally modified by adjusting the curvature of the reticle, for instance by providing a chrome pattern on the top surface of a quartz base and grinding away portions of the bottom surface of the quartz base. The image displacement data may also vary as a function of lens heating so that the reticle compensates for lens heating associated with the reticle pattern.
REFERENCES:
patent: 4585342 (1986-04-01), Lin et al.
patent: 4759626 (1988-07-01), Kroko
patent: 5308991 (1994-05-01), Kaplan
patent: 5329334 (1994-07-01), Yim et al.
patent: 5402224 (1995-03-01), Hirukawa et al.
patent: 5723238 (1998-03-01), Moore et al.
Dawson Robert
Fulford Jr. H. Jim
Gardner Mark I.
Hause Frederick N.
Michael Mark W.
Advanced Micro Devices , Inc.
Young Christopher G.
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