Reticle system for manufacturing integrated circuit systems

Details Reticle system for manufacturing integrated circuit systems Reticle system for manufacturing integrated circuit systems

2011-01-11

2011-01-11

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

Reexamination Certificate

active

07867698

ABSTRACT:
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow.

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Yamamoto, Yasuhisa et al., Multi-layer reticle (MLR) strategy application to double-patterning/double-exposure for better overlay error control and mask cost reduction, Photomask Technology 2007, Robert J. Naber; Hiroichi Kawahira, Editors, pp. 67302(x), vol. 6730.

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