Reticle stages for lithography systems and lithography methods

Details Reticle stages for lithography systems and lithography methods Reticle stages for lithography systems and lithography methods

2006-04-13

2009-12-01

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S053000

Reexamination Certificate

active

07626682

ABSTRACT:
Reticle stages for lithography systems and lithography methods are disclosed. In a preferred embodiment, a lithography reticle stage includes a first region adapted to support a first reticle, and at least one second region adapted to support a second reticle.

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