Reticle mask exposure method comprising blank to remove incomple

Details Reticle mask exposure method comprising blank to remove incomple Reticle mask exposure method comprising blank to remove incomple

1993-01-26

1994-11-08

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430312, G03F 900

Patent

active

053625838

ABSTRACT:
A reticle mask comprising: an exposure pattern for forming a unit for integrated circuits; and a window serving as a blank pattern, said window serving as a blank pattern existing in a region except the exposure pattern; and a method for exposing a pattern for integrated circuits which comprises the steps of: shielding said reticle mask at the exposure pattern for forming the units for integrated circuits; positioning and exposing the blank pattern over an incomplete pattern existing at the periphery of the photoresist film; and removing the exposed incomplete pattern by development.

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