Reticle inspecting apparatus and reticle inspecting method

Details Reticle inspecting apparatus and reticle inspecting method Reticle inspecting apparatus and reticle inspecting method

2005-12-30

2010-02-16

Mariam, Daniel G (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

Reexamination Certificate

active

07664309

ABSTRACT:
The present invention efficiently suppresses a false defect and realizes reticle inspection where a defect can be detected with high detection sensitivity. In a reticle inspecting method, reticle inspection data generated based on reticle design data is captured. Also, drawing position accuracy measurement data of the reticle is captured to obtain a first correction amount for correcting a position accuracy component of the reticle. Based on the first correction amount, the inspection data is corrected. Based on the corrected inspection data, a defect on the reticle is detected.

REFERENCES:
patent: 5995199 (1999-11-01), Shinozaki et al.
patent: 6180289 (2001-01-01), Hirayanagi
patent: 2003/0143472 (2003-07-01), Koizumi et al.

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