Reticle independent reticle stage calibration

Details Reticle independent reticle stage calibration Reticle independent reticle stage calibration

2005-01-11

2005-01-11

Smith, Zandra V. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With light detector

Reexamination Certificate

active

06842247

ABSTRACT:
A system, apparatus, and method for calibrating the reticle of a lithographic system is presented herein. The method includes imaging a reticle through a lithographic system, measuring a set of height offsets based on the imaged reticle and decomposing the set of measured height offsets in accordance with a plurality of distortional factors. The invention further comprises determining the reticle stage deformation attributes based on the distortional factors and the reticle deformation attributes, and then calibrating the reticle stage based on the stage deformation attributes.

REFERENCES:
patent: 6002487 (1999-12-01), Shirata
patent: 6027843 (2000-02-01), Kojima et al.
patent: 20040130689 (2004-07-01), Starikov et al.

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