Reticle gripper barrier system for lithography use

Details Reticle gripper barrier system for lithography use Reticle gripper barrier system for lithography use

2006-11-14

2006-11-14

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C430S005000

Reexamination Certificate

active

07136151

ABSTRACT:
A reticle gripper barrier system for use in concert with a reticle gripper device that contacts a lithographic reticle is presented. In a particular embodiment, a reticle gripper barrier device includes a support plate affixed near or to the reticle gripper device and a gripper barrier or a set of concentric gripper barriers affixed to or near the support plate. A reticle gripper barrier system includes one or more reticle gripper barrier devices that form a complete or partial barrier around the point or points where the reticle gripper device contacts a lithographic reticle. The gripper barriers block contaminants and prevent them from migrating towards the mask and do not contact the lithographic reticle. The gripper barriers can be interleaved with corresponding contact barriers on a lithographic reticle, which the gripper device is contacting.

REFERENCES:
patent: 6216873 (2001-04-01), Fosnight et al.
patent: 6239863 (2001-05-01), Catey et al.
patent: 6862817 (2005-03-01), Lenox
patent: 6984474 (2006-01-01), Roux et al.
patent: 2003/0218728 (2003-11-01), del Puerto et al.
U.S. Appl. No. 10/628,326, filed Jul. 29, 2003, titled “Reticle Barrier System for Extreme Ultra-Violet Lithography.”

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