Reticle frame assembly

Geometrical instruments – Gauge – Collocating

Patent

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Details

33645, 33623, B41B 1100

Patent

active

049860070

ABSTRACT:
A reticle frame for precisely holding a reticle or mask used in photolithography with a minimum of distortion. A plurality of adjusting screws are used to accurately position the reticle within the frame. Transversely compliant axial loading springs opposing the adjusting screws reduce the bending forces acting on the reticle. Precision balls are used to establish a plane for the reticle further reducing bending forces thereon causing less distortion and thereby proving greater resolution when the reticle image is reproduced on a semiconductor wafer.

REFERENCES:
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patent: 2689411 (1954-09-01), Huck
patent: 2825142 (1958-03-01), Johnson
patent: 3617126 (1971-11-01), Gillespie
patent: 3626600 (1971-12-01), Gaither
patent: 3950095 (1976-04-01), Bouygues et al.
patent: 4408830 (1983-10-01), Wutherich
patent: 4575942 (1986-03-01), Moriyama
patent: 4667415 (1987-05-01), Barsky

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