Geometrical instruments – Gauge – Collocating
Patent
1987-03-25
1991-01-22
Haroian, Harry N.
Geometrical instruments
Gauge
Collocating
33645, 33623, B41B 1100
Patent
active
049860070
ABSTRACT:
A reticle frame for precisely holding a reticle or mask used in photolithography with a minimum of distortion. A plurality of adjusting screws are used to accurately position the reticle within the frame. Transversely compliant axial loading springs opposing the adjusting screws reduce the bending forces acting on the reticle. Precision balls are used to establish a plane for the reticle further reducing bending forces thereon causing less distortion and thereby proving greater resolution when the reticle image is reproduced on a semiconductor wafer.
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patent: 2825142 (1958-03-01), Johnson
patent: 3617126 (1971-11-01), Gillespie
patent: 3626600 (1971-12-01), Gaither
patent: 3950095 (1976-04-01), Bouygues et al.
patent: 4408830 (1983-10-01), Wutherich
patent: 4575942 (1986-03-01), Moriyama
patent: 4667415 (1987-05-01), Barsky
Engelbrecht Orest
Laganza Joseph L.
Fattibene Paul A.
Haroian Harry N.
SVG Lithography Systems, Inc.
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