Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-03-22
2011-03-22
Rosasco, Stephen (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07910265
ABSTRACT:
A reticle for use in a semiconductor lithographic system includes at least two separated reticle parts. Each part includes a pattern to be transferred lithographically to a substrate. At least one of the two separated reticle parts is independently replaceable.
REFERENCES:
patent: 2001/0002301 (2001-05-01), Suzuki
patent: 2007/0042276 (2007-02-01), Bae
patent: 2007/0258076 (2007-11-01), Maria Derksen et al.
Schneider Jens
Temchenko Vlad
Alam Rashid
Infineon - Technologies AG
Rosasco Stephen
Slater & Matsil L.L.P.
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