Reticle for use in a semiconductor lithographic system and...

Details Reticle for use in a semiconductor lithographic system and... Reticle for use in a semiconductor lithographic system and...

2011-03-22

2011-03-22

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07910265

ABSTRACT:
A reticle for use in a semiconductor lithographic system includes at least two separated reticle parts. Each part includes a pattern to be transferred lithographically to a substrate. At least one of the two separated reticle parts is independently replaceable.

REFERENCES:
patent: 2001/0002301 (2001-05-01), Suzuki
patent: 2007/0042276 (2007-02-01), Bae
patent: 2007/0258076 (2007-11-01), Maria Derksen et al.

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