Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-03-22
1997-12-16
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, 430324, G03F 900
Patent
active
056983476
ABSTRACT:
A reticle for off-axis illumination which has spaces with different sizes wherein subsidiary patterns are formed at space patterns which are larger in size than the space of maximal focus latitude margin and thus, inappropriate for off-axis illumination, in such a way that the diffraction angle may be equivalent or similar in the total patterns of the reticle. Repetitively arranged, the subsidiary patterns are of dot shape or protuberance shape which have sizes insufficient to form image on the wafer. As a result, the marginal space is, in size, equivalent or similar to the pattern of the maximal focus latitude margin, thereby making small process margin available in large space patterns as large as the process margin available in small space patterns. Therefore, the progress allowance for semiconductor fabrication is enlarged uniformly, and a significant improvement is achieved in the reliability and process yield as well as in uniformity of the patterns.
REFERENCES:
patent: 5446587 (1995-08-01), Kang et al.
patent: 5447810 (1995-09-01), Chen et al.
Hyundai Electronics Industries Co,. Ltd.
Rosasco S.
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