Reticle for off-axis illumination

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430322, 430324, G03F 900

Patent

active

056983476

ABSTRACT:
A reticle for off-axis illumination which has spaces with different sizes wherein subsidiary patterns are formed at space patterns which are larger in size than the space of maximal focus latitude margin and thus, inappropriate for off-axis illumination, in such a way that the diffraction angle may be equivalent or similar in the total patterns of the reticle. Repetitively arranged, the subsidiary patterns are of dot shape or protuberance shape which have sizes insufficient to form image on the wafer. As a result, the marginal space is, in size, equivalent or similar to the pattern of the maximal focus latitude margin, thereby making small process margin available in large space patterns as large as the process margin available in small space patterns. Therefore, the progress allowance for semiconductor fabrication is enlarged uniformly, and a significant improvement is achieved in the reliability and process yield as well as in uniformity of the patterns.

REFERENCES:
patent: 5446587 (1995-08-01), Kang et al.
patent: 5447810 (1995-09-01), Chen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reticle for off-axis illumination does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reticle for off-axis illumination, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reticle for off-axis illumination will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-204090

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.