Reticle for determining rotational error

Details Reticle for determining rotational error Reticle for determining rotational error

2005-04-29

2008-10-28

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000, C430S030000, C355S052000, C355S053000

Reexamination Certificate

active

07442474

ABSTRACT:
A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a first pattern and an error-free fine alignment target, in the stepper. In another step, the wafer is aligned in the stepper using the error-free fine alignment target. Then a second pattern is created on the wafer overlaying said first pattern. In another step, the rotational error portion of the total misalignment error is determined by measuring the circumferential misalignment between the first pattern and the second pattern.

REFERENCES:
patent: 4521114 (1985-06-01), Van Peski et al.
patent: 5521036 (1996-05-01), Iwamoto et al.
patent: 6541283 (2003-04-01), Leroux
patent: 6552790 (2003-04-01), Templeton et al.
patent: 6558852 (2003-05-01), Tawarayama et al.
patent: 6912435 (2005-06-01), Pellegrini et al.
patent: 2001/0049589 (2001-12-01), Yasuda et al.

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