Reticle focus measurement system using multiple...

Details Reticle focus measurement system using multiple... Reticle focus measurement system using multiple...

2005-02-01

2005-02-01

Turner, Samuel A. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S500000

Reexamination Certificate

active

06850330

ABSTRACT:
A first set of interferometric measuring beams is used to determine a location of a patterned surface of a reticle and a reticle focus plane for a reticle that is back clamped to a reticle stage. A second set of interferometric measuring beams is used to determine a map of locations of the reticle stage during scanning in a Y direction. The two sets of interferometric measuring beams are correlated to relate the reticle focal plane to the map of the reticle stage. The information is used to control the reticle stage during exposure of a pattern on the patterned surface of the reticle onto a wafer.

REFERENCES:
patent: 5408320 (1995-04-01), Katagiri et al.
patent: 6359678 (2002-03-01), Ota
patent: 6406820 (2002-06-01), Ota
patent: 1160629 (2001-12-01), None
patent: WO 2004012245 (2004-02-01), None
Copy of Australian Search Report for European Appln. 200305649-6 mailed Aug. 19, 2004.
English Language Abstract of JP 11-307436 dated Nov. 5, 1999.
English Language Abstract of JP 10-335234 dated Dec. 18, 1999.

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