Reticle defect inspection apparatus and reticle defect...

Details Reticle defect inspection apparatus and reticle defect... Reticle defect inspection apparatus and reticle defect...

2011-02-22

2011-02-22

Stafira, Michael P (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237300

Reexamination Certificate

active

07894051

ABSTRACT:
A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

REFERENCES:
patent: 7251033 (2007-07-01), Phan et al.
patent: 2004/0117055 (2004-06-01), Seidel et al.
patent: 2007/0030471 (2007-02-01), Troost et al.
patent: 11-83753 (1999-03-01), None
patent: 2002-75815 (2002-03-01), None
patent: 2006-98156 (2006-04-01), None

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