Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-02-14
2006-02-14
Bali, Vikkram (Department: 2623)
Image analysis
Applications
Manufacturing or product inspection
C382S145000, C382S143000
Reexamination Certificate
active
06999611
ABSTRACT:
Defects are detected in a reticle used in integrated circuit chip fabrication by obtaining digital image data corresponding to an image of the reticle. Typically, this is accomplished by scanning the reticle using a laser scanner. The digital image data are then processed according to predetermined criteria to identify defects. Such processing may include, for example, processing the digital image data in comparison to reference digital image data for the same or a similar portion of the reticle. Next, a response that would be produced if the reticle were to be utilized in a photolithographic system is simulated by processing the digital image data corresponding to the reticle.
REFERENCES:
patent: 5475766 (1995-12-01), Tsuchiya et al.
patent: 5619429 (1997-04-01), Aloni et al.
patent: 5965306 (1999-10-01), Mansfield et al.
patent: 6016357 (2000-01-01), Neary et al.
patent: 6171731 (2001-01-01), Medvedeva et al.
patent: 6223139 (2001-04-01), Wong et al.
Budd et al, “Development and Application of a New Tool for Lithographic Mask Evaluation, the Stepper Equivalent Aerial Image Measurement System (AIMS)”, 1997, IBM Journal of Research and Development, vol. 41, No. 1/2.
Lopez Daniel
Schellenberg Frank
Bali Vikkram
KLA-Tencor Corporation
Mitchell Silberberg & Knupp LLP
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