Reticle comprising phase shifter with a tapered edge

Details Reticle comprising phase shifter with a tapered edge Reticle comprising phase shifter with a tapered edge

1991-12-24

1994-10-18

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430325, G03F 900

Patent

active

053567382

ABSTRACT:
The edge of a 180.degree. phase shifter on a glass substrate of a reticle has a tapered structure, and a reduction of the intensity of transmitted light by an interference in the boundary area between the phase shifter and the glass substrate is moderated.

REFERENCES:
patent: 4762396 (1988-08-01), Dumant et al.
patent: 5045417 (1991-09-01), Okamoto
Marsato Shibuya, "Original Plate To Be Projected For Use In Transmission Illumination", Apr. 1982 JP 57-62052 (Abstract Only).
J. Miyazaki, et al., "A study of phase shifting mask construction applied for positive resist process", Association of Applied Physics, 27P-ZG-6, Collection of Preliminary Sectures at 1990 Autumn Meeting, 1 page (Drawing only).

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