Reticle cleaning without damaging pellicle

Cleaning and liquid contact with solids – Processes – With treating fluid motion

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 42, 134200, 134902, 134 2, B08B 300, B08B 302

Patent

active

059388609

ABSTRACT:
A reticle having a pellicle frame and pellicle membrane is cleaned without removing or damaging the pellicle membrane. A cover encases the pellicle membrane and pellicle frame, sealing the pellicle from the external environment during a cleaning process. The cover fits around the periphery of the pellicle frame and covers the pellicle membrane. An edge of the cover in contact with the reticle forms a seal. The reticle is fastened to reticle supports on a spin chuck during the cleaning process. An anchor plate presses the cover to the reticle, maintaining the pellicle sealed from the external environment. The cover and reticle are sandwiched together between the anchor plate and spin chuck.

REFERENCES:
patent: 4624557 (1986-11-01), Winn
patent: 4715392 (1987-12-01), Abe et al.
patent: 4776462 (1988-10-01), Kosugi et al.
patent: 4898058 (1990-02-01), Seifert
patent: 5025924 (1991-06-01), Watanabe
patent: 5314068 (1994-05-01), Nakazato et al.
patent: 5330053 (1994-07-01), Tabuchi et al.
patent: 5397665 (1995-03-01), Tabuchi et al.
patent: 5634230 (1997-06-01), Maurer
patent: 5669979 (1997-09-01), Elliott et al.
patent: 5743409 (1998-04-01), Nakahara et al.
patent: 5814156 (1998-09-01), Elliott et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reticle cleaning without damaging pellicle does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reticle cleaning without damaging pellicle, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reticle cleaning without damaging pellicle will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-311820

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.