Reticle cleaning apparatus for wafer exposure system

Details Reticle cleaning apparatus for wafer exposure system Reticle cleaning apparatus for wafer exposure system

1998-09-18

2000-05-02

Bennett, Henry

Drying and gas or vapor contact with solids

Apparatus

Houses, kilns, and containers

34212, 34222, 34223, 34224, 34230, F26B 1122

Patent

active

060557427

ABSTRACT:
A reticle cleaning apparatus for a wafer exposure system includes a chamber enclosing the reticle, a door opening and closing at least one side of the chamber, a door switching member opening and closing the door coupled to the chamber including the door, a gas injection nozzle at an upper portion of the chamber, a nozzle transport member moving the gas injection nozzle in a vertical direction, a gas supply member supplying a cleaning gas into the gas injection nozzle, an ion injection nozzle over the gas injection nozzle, an ion supply member supplying ions into the ion injection nozzle, and a drain member draining the cleaning gas outside the chamber.

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