Reticle carrier apparatus and method that tilts reticle for...

Details Reticle carrier apparatus and method that tilts reticle for... Reticle carrier apparatus and method that tilts reticle for...

2006-10-31

2006-10-31

Gravini, S. (Department: 3749)

Drying and gas or vapor contact with solids

Process

With nondrying treating of material

C034S078000, C034S090000, C034S218000, C134S102100

Reexamination Certificate

active

07127830

ABSTRACT:
A method and apparatus for cleaning, rinsing and drying a reticle used in semiconductor device manufacturing, tilts the reticle during the drying process to prevent water from the rinsing process from collecting and remaining on the reticle. The rectangularly shaped reticle is held in a carrier and the top and bottom edges of the reticle may form an angle of at least about 8° with the horizontal to maximize drying efficiency, when the carrier is placed on a horizontal surface or suspended from above.

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Page titled “Akrion's Reticle Mask Carrier” from Akrion Business Overview presented by Akron representative to Wafer Tech, on Apr. 11, 2002.

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