Optics: measuring and testing – Position or displacement – Position transverse to viewing axis
Reexamination Certificate
2008-08-27
2010-10-12
Toatley, Jr., Gregory J (Department: 2877)
Optics: measuring and testing
Position or displacement
Position transverse to viewing axis
C356S603000
Reexamination Certificate
active
07812972
ABSTRACT:
A reticle has a mask substrate, a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies, and a device pattern adjacent to the test pattern established on the mask substrate.
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Asano Masafumi
Kanai Hideki
Sato Takashi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Toatley Jr. Gregory J
Underwood Jarreas C.
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