Reticle, apparatus for monitoring optical system, method for...

Optics: measuring and testing – Position or displacement – Position transverse to viewing axis

Reexamination Certificate

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C356S603000

Reexamination Certificate

active

07812972

ABSTRACT:
A reticle has a mask substrate, a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies, and a device pattern adjacent to the test pattern established on the mask substrate.

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