Reticle and optical characteristic measuring method

Optics: measuring and testing – Lens or reflective image former testing

Reexamination Certificate

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Reexamination Certificate

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11123139

ABSTRACT:
A reticle having a test pattern for measurement of an optical characteristic of a projection optical system has a pattern adapted so that a high frequency component of a spectrum at a pupil plane of the projection optical system is reduced or suppressed. Illumination light is projected to the test pattern of the reticle in one direction or plural directions, and positions of images of the test pattern, formed by the projections in the plural directions, are detected and, based thereon, the optical characteristic of the projection optical system is measured.

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Partial Translation of Nov. 18, 2005 Korean Official Action.
Korean Office Action dated Nov. 18, 2005, issued in corresponding Korean patent application No. 10-2004-7003072.
Chinese Office Action dated Oct. 14, 2005, issued in corresponding Chinese patent application No. 02816669.8, with an English translation.

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