Reticle and optical characteristic measuring method

Details Reticle and optical characteristic measuring method Reticle and optical characteristic measuring method

2006-01-03

2006-01-03

Font, Frank G. (Department: 2877)

Optics: measuring and testing

Lamp beam direction or pattern

C356S124000, C356S401000

Reexamination Certificate

active

06982786

ABSTRACT:
In an optical characteristic measuring method for measuring an optical characteristic of a projection optical system (10a), a reticle (9) having a plurality of patterns (TP) is supplied, and scattered light from an aperture is directed to the plurality of patterns (TP), whereby light beams are projected onto the plurality of patterns in mutually different directions, by which images of the plurality of patterns are formed through the projection optical system (10a). Positions of images of the plurality of patterns, respectively, are detected and, by use of the result of detection, the optical characteristic of the projection optical system is detected. This accomplishes an optical characteristic measuring method and a reticle to be used therefor, which are suitable for measuring an optical characteristic of an optical system such as wavefront aberration, for example, at high precision.

REFERENCES:
patent: 4943733 (1990-07-01), Mori et al.
patent: 5173380 (1992-12-01), Kamon
patent: 5300967 (1994-04-01), Kamon
patent: 5420417 (1995-05-01), Shiraishi
patent: 5644390 (1997-07-01), Yasuzato
patent: 5828455 (1998-10-01), Smith et al.
patent: 5973771 (1999-10-01), Hibbs et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6057914 (2000-05-01), Yedur et al.
patent: 6249335 (2001-06-01), Hirukawa et al.
patent: 6310679 (2001-10-01), Shiraishi
patent: 6312373 (2001-11-01), Ichihara
patent: 6317198 (2001-11-01), Sato et al.
patent: 6356345 (2002-03-01), McArthur et al.
patent: 6456382 (2002-09-01), Ichihara et al.
patent: 6548312 (2003-04-01), Hayano et al.
patent: 6556286 (2003-04-01), La Fontaine et al.
patent: 6573015 (2003-06-01), Fujimoto
patent: 6580492 (2003-06-01), Fujimoto
patent: 2001/0028462 (2001-10-01), Ichihara et al.
patent: 2002/0008860 (2002-01-01), Fujimoto
patent: 2002/0015158 (2002-02-01), Shiode et al.
patent: 2002/0159048 (2002-10-01), Inoue et al.
patent: 2002/0191195 (2002-12-01), Ichihara et al.
patent: 6-120116 (1994-09-01), None
patent: 2000-97666 (2000-04-01), None
patent: 2001-338866 (2001-12-01), None
patent: 2002-33269 (2002-01-01), None
patent: 2002-250677 (2002-09-01), None
International Search Report dated Oct. 22, 2002, and issued on Nov. 5, 2002, in corresponding International patent appln. No. PCT/JP02/07342.
International Preliminary Examination Report dated Oct. 30, 2003, transmitted in a Notification of Translation of Copies of the international Preliminary Examination Report, mailed Nov. 18, 2004, in corresponding PCT application number PcT/JP2002/007342.

Affiliated with

Also associated with

Rating

Reticle and optical characteristic measuring method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reticle and optical characteristic measuring method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reticle and optical characteristic measuring method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3572390