Reticle and optical characteristic measuring method

Optics: measuring and testing – Lens or reflective image former testing

Reexamination Certificate

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Reexamination Certificate

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07375805

ABSTRACT:
A wavefront aberration measuring method for measuring wavefront aberration of a projection optical system. The method includes providing a reticle having lines and spaces in which, with respect to a repetition direction thereof and from a center to a periphery, a pitch of the spaces is substantially constant while widths of the spaces gradually decrease and in which adjacent lines are not resolvable by the projection optical system, projecting light fluxes to the lines and spaces from different directions, whereby plural images of the lines and spaces are formed through the projection optical system, and detecting respective positions of the plural images and detecting, by use of the result of the detection, the wavefront aberration of the projection optical system.

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