Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-03-31
1996-09-03
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 437229, G03F 900
Patent
active
055522513
ABSTRACT:
A reticle provided with mother and son verniers for measuring a rotation of the reticle, the mother vernier being disposed at a portion of the reticle, which portion corresponds to a center of a lens equipped in the exposure equipment using the reticle. At least one pair of son verniers are disposed at areas of the reticle uniformly spaced apart from the mother vernier along a horizontal line passing through the mother vernier, respectively. The reticle provides a means and method of minimizing an error caused by a distortion of a lens and precisely measuring a rotation error.
REFERENCES:
patent: 5017514 (1991-05-01), Nishimoto
patent: 5262258 (1993-11-01), Yanagisawa
Hyundai Electronics Industries Co,. Ltd.
Rosasco S.
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