Reticle and a method for measuring blind setting accuracy using

Details Reticle and a method for measuring blind setting accuracy using Reticle and a method for measuring blind setting accuracy using

1995-04-03

1997-04-01

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 356400, 356401, G03F 900

Patent

active

056164386

ABSTRACT:
A method for setting the blind of a stepper comprising the steps of: forming a first pattern which is made on a wafer by said blind, and a second pattern which is made on the wafer by chrome patterns of a reticle; comparing said first pattern with said second pattern; and measuring a setting error of said blind from the difference between said first pattern and second pattern.

REFERENCES:
patent: 5444538 (1995-08-01), Pellegrini

Affiliated with

Also associated with

Rating

Reticle and a method for measuring blind setting accuracy using does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reticle and a method for measuring blind setting accuracy using , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reticle and a method for measuring blind setting accuracy using will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-537872