Reticle

Details Reticle Reticle

1995-03-22

1996-09-24

Fulton, Christopher W.

Geometrical instruments

Gauge

Collocating

33286, 33533, G01B 2100, G01B 500

Patent

active

055578551

ABSTRACT:
A reticle which can detect precisely an error in reticle rotation. A first main vernier is formed at an outer side of the right end of the unit field and a sub vernier is formed at the left end. A second main vernier is formed at the outer side of the upper end of the unit field, and a sub vernier is formed at the lower end. Another reticle uses a first main vernier on the right scribe lane zone, and a sub vernier on the left. A second vernier is formed on the upper side, with its sub on the lower side. These verniers are used together to determine an error.

REFERENCES:
patent: 4520570 (1985-06-01), Bednorz et al.
patent: 4635373 (1987-01-01), Miyazaki et al.
patent: 4934064 (1990-06-01), Yamaguchi et al.

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