Retainer ring used for polishing a structure for...

Details Retainer ring used for polishing a structure for... Retainer ring used for polishing a structure for...

2011-01-11

2011-01-11

Eley, Timothy V (Department: 3723)

Abrading

Abrading process

Utilizing fluent abradant

C451S041000, C451S059000, C451S288000, C451S442000

Reexamination Certificate

active

07867060

ABSTRACT:
Disclosed is a polishing method for polishing a surface of a structure for magnetic-head manufacture by CMP in the process of manufacturing a magnetic head using a ceramic substrate made of a ceramic material containing AlTiC, the structure including the ceramic substrate and one or more layers formed thereon, and having the surface to be polished. The polishing method uses a retainer ring made of a ceramic material containing AlTiC.

REFERENCES:
patent: 6273803 (2001-08-01), Wang et al.
patent: 6390904 (2002-05-01), Gleason et al.
patent: 6654205 (2003-11-01), O'Hara et al.
patent: 7210991 (2007-05-01), Van Der Veen et al.
patent: 7520955 (2009-04-01), Zuniga et al.
patent: 7534364 (2009-05-01), Zuniga et al.
patent: 2007/0232203 (2007-10-01), Fukuda et al.
patent: 2008/0067429 (2008-03-01), Fuse et al.
patent: A-8-187657 (1996-07-01), None
patent: 2000052241 (2000-02-01), None
patent: A-2000-52241 (2000-02-01), None
patent: A 2000-84836 (2000-03-01), None
patent: A 2002-355753 (2002-12-01), None
patent: A 2006-4992 (2006-01-01), None
patent: A 2007-301713 (2007-11-01), None

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