RET for optical maskless lithography

Details RET for optical maskless lithography RET for optical maskless lithography

2005-02-25

2009-11-17

McPherson, John A (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000, C430S396000, C430S311000, C347S239000, C359S224200, C250S492200, C250S492220

Reexamination Certificate

active

07618751

ABSTRACT:
The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.

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