Restriction structure for reducing gas formation in a high press

Details Restriction structure for reducing gas formation in a high press Restriction structure for reducing gas formation in a high press

1999-01-25

2000-11-07

Moulis, Thomas N.

Internal-combustion engines

Charge forming device

Fuel flow regulation between the pump and the charge-forming...

F02M 3704

Patent

active

061421278

ABSTRACT:
A fuel delivery system 10 includes a fuel rail 22 to supply fuel to at least one fuel injector 26, a high pressure fuel pump 20 to provide fuel to the fuel rail 22, a fuel regulator 28 to regulate fuel pressure at the fuel rail 22, and flow restriction structure 30, 32 disposed in a fuel return line 34 between the fuel regulator 28 and the high pressure fuel pump 20. The flow restriction structure 30, 32 is constructed and arranged to substantially prevent bubbles from reaching the high pressure fuel pump 20 when the high pressure fuel pump is providing fuel in a certain flow range to the fuel rail 22. The flow restriction structure defines at least one flow restricting orifice.

REFERENCES:
patent: 4274380 (1981-06-01), De Vulpillieres
patent: 4955943 (1990-09-01), Hensel et al.
patent: 5285759 (1994-02-01), Terada et al.
patent: 5832900 (1998-11-01), Lorraine
patent: 5890518 (1999-04-01), Fischerkeller
patent: 6021759 (2000-02-01), Okajima et al.
patent: 6029634 (1999-04-01), Graham
PCT International Search Report: International Application No. PCT/US99/30400, International Filing Date, Dec. 17, 1999 and Applicant, Siemens Automotive Corporation.

Affiliated with

Also associated with

Rating

Restriction structure for reducing gas formation in a high press does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Restriction structure for reducing gas formation in a high press, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Restriction structure for reducing gas formation in a high press will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1631461