Resolution enhancing technology using phase assignment bridges

Details Resolution enhancing technology using phase assignment bridges Resolution enhancing technology using phase assignment bridges

2005-05-03

2005-05-03

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S022000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

06887633

ABSTRACT:
In one embodiment, a spacing is determined for each edge of a number of features in a photolithographic design. The edges have at least a partially predictable layout. Based on the spacing and the predictable layout, a bridge structure is generated. Each bridge of the bridge structure connects one of the edges to an edge of a neighboring feature. Then, the features and the bridge structure are provided for a phase assignment. The phase assignment assigns features at opposite ends of each bridge in the bridge structure to opposite phases. In another embodiment, a sub-resolution assist feature (SRAF) is introduced for an edge of a feature and a bridge is generated from the feature to the SRAF. Then, the feature and the SRAF are assigned to opposite phases based on the relationship defined by the bridge.

REFERENCES:
patent: 20030018948 (2003-01-01), Chang et al.

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