Resolution enhancement for macro wafer inspection

Radiant energy – Photocells; circuits and apparatus – Photocell controlled circuit

Reexamination Certificate

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Details

C250S559050, C250S559060, C250S559070, C250S559400, C356S431000, C356S237400, C356S237500

Reexamination Certificate

active

10992244

ABSTRACT:
A method and apparatus for improving system resolution for a defect line scanner while not increasing aliasing effects, or alternatively to maintain system resolution for a defect scanner while decreasing aliasing effects. This is accomplished by decreasing effective pixel size for a CCD array defect line scanner while not decreasing signal-to-noise ratio, with minimal changes to the current machine. The method utilizes a sampling phase shift between successive lines of a multi-line sensor array during scanning.

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patent: 2004/0101210 (2004-05-01), Weinstein et al.
patent: 2005/0146714 (2005-07-01), Kitamura et al.

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