Optics: measuring and testing – Dimension – Width or diameter
Reexamination Certificate
2007-09-25
2007-09-25
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Dimension
Width or diameter
C356S601000, C356S625000, C250S559190, C250S559220, C250S559240
Reexamination Certificate
active
10447609
ABSTRACT:
A resolution enhanced optical metrology system to examine a structure formed on a semiconductor wafer includes a source configured to direct an incident beam at the structure through a coupling element. The coupling element is disposed between the source and the structure with a gap having a gap height defined between the coupling element and the structure.
REFERENCES:
patent: 5220403 (1993-06-01), Batchelder et al.
patent: 5940175 (1999-08-01), Sun
patent: 6775015 (2004-08-01), Bischoff et al.
patent: 6785638 (2004-08-01), Niu et al.
patent: 6891626 (2005-05-01), Niu
patent: 6934024 (2005-08-01), Zhan et al.
patent: 6943400 (2005-09-01), Manabe
patent: 6943900 (2005-09-01), Niu et al.
patent: 2003/0184761 (2003-10-01), Degertekin et al.
Stock, Jr. Gordon J.
Timbre Technologies, Inc.
Toatley , Jr. Gregory J.
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