Resolution device for semiconductor thin films

Measuring and testing – Sampler – sample handling – etc. – Flow divider – deflector – or interceptor

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7386321, 356 36, 422299, G01N 128

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active

045848866

ABSTRACT:
The resolution device for semiconductor films according to the present invention comprises a sealed container, a storage container installed in the sealed container for storing hydrofluoric acid to generate hydrogen fluoride gas, a semiconductor film supporter installed in the sealed container, and a receptacle of resolved solution installed at the bottom of the sealed container for receiving the resolved solution of the semiconductor films. The semiconductor films held by the film supporter are resolved by hydrogen fluoride gas which is generated from the storage container of hydrofluoric acid and has a low impurity content. The resolved solution is collected in the receptacle for resolved solution, and is supplied directly to the flameless atomic absorption spectrophotometer.

REFERENCES:
patent: 3824016 (1974-07-01), Woodriff et al.
patent: 3976377 (1976-08-01), Wu et al.
patent: 4361401 (1982-11-01), Smith, Jr. et al.
"Layerwise Atomic-Absorption Analysis of Semiconductor Films with Sampling by Ion Etching", Industrial Laboratory; vol. 41, No. 6, pp. 843-845; 12-1975; B. I. Kuzovkin et al.
"Determination of Platinum and Palladium in Blood and Urine by Flameless Atomic Absorption Spectrophotometry"; Analytical Chemistry; vol. 48, No. 11, pp. 1472-1474; Sep. 1976; A. H. Jones.
Mitchell, J. W., "Teflon Apparatus for Vapor Phase Destruction of Silicate Materials", Analytical Chemistry, vol. 46, No. 2, p. 326, Feb. 1974.

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