Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1988-04-08
1991-01-29
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430527, G03C 176
Patent
active
049886126
ABSTRACT:
The use of polymers and polymer blends having defined resistance changes during heating are particularly useful in resistively heated photothermographic elements.
REFERENCES:
patent: 3492122 (1970-01-01), Takenaka et al.
patent: 3514291 (1970-05-01), Vanpoecke et al.
patent: 3658573 (1972-04-01), Guestaux et al.
patent: 4409316 (1983-10-01), Zller-Pendry et al.
patent: 4409322 (1983-10-01), Ezaki et al.
patent: 4582784 (1986-04-01), Fukugawa et al.
patent: 4582784 (1986-04-01), Fukugawa et al.
patent: 4643964 (1987-02-01), Sawada et al.
patent: 4643969 (1987-02-01), Sawada et al.
Ask David T.
LaBelle Gary E.
Brammer Jack P.
Kirn Walter N.
Litman Mark A.
Minnesota Mining and Manufacturing Company
Sell Donald M.
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