Coating apparatus – Gas or vapor deposition – With treating means
Patent
1988-08-22
1990-09-25
Morgenstern, Norman
Coating apparatus
Gas or vapor deposition
With treating means
118725, 118728, 156613, 156614, 156DIG68, 248325, 248364, 427 55, C23C 1646
Patent
active
049585924
ABSTRACT:
A plural substrate CVD apparatus for diamond crystal production utilizes spaced apart vertical, parallel, planar substrate panels with an electrical (direct current, D.C.) resistance filament heater therebetween. A hydrogen-hydrocarbon gas mixture flows between panels to come into contact with the heater and the panels to cause diamond crystal nucleation and growth on the substrate panels. The apparatus includes means for maintaining the spaced relationship of the heater from the substrate surfaces, comprising a rod member attached to one end of the heater and tensioned by a cable passing over a pulley member and attached to a weight.
REFERENCES:
patent: 4434188 (1984-02-01), Kamo et al.
Anthony Thomas R.
DeVries Robert C.
Engler Richard A.
Ettinger Robert H.
Fleischer James F.
Davis Jr. James C.
General Electric Company
Morgenstern Norman
Owens Terry J.
Pittman William H.
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