Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-02-08
2010-06-15
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S270100, C430S273100, C430S275100, C430S317000, C430S318000
Reexamination Certificate
active
07736822
ABSTRACT:
There is provided a resist underlayer coating forming composition used in processes for manufacturing a mask blank and a mask, and a mask blank and a mask manufactured from the composition. The resist underlayer coating forming composition comprises a polymer compound having a halogen atom-containing repeating structural unit and a solvent. In a mask blank including a thin film for forming transfer pattern and a chemically-amplified type resist coating on a substrate in that order, the composition is used for forming a resist underlayer coating between the thin film for forming transfer pattern and the resist coating. The polymer compound is preferably a compound containing a halogen atom in an amount of at least 10 mass %.
REFERENCES:
patent: 5919599 (1999-07-01), Meador et al.
patent: 6495305 (2002-12-01), Enomoto et al.
patent: 6605394 (2003-08-01), Montgomery et al.
patent: 7309560 (2007-12-01), Sakamoto et al.
patent: A 2003-107675 (2003-04-01), None
patent: WO 03/071357 (2003-08-01), None
Enomoto Tomoyuki
Hashimoto Masahiro
Nagai Masaki
Sakaguchi Takahiro
Sakamoto Rikimaru
Hoya Corporation
Nissan Chemical Industries Ltd.
Oliff & Berridg,e PLC
Walke Amanda C.
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