Resist stripping method and apparatus

Cleaning and liquid contact with solids – Processes – Work handled in bulk or groups

Reexamination Certificate

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C134S034000, C134S037000, C134S033000

Reexamination Certificate

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06913027

ABSTRACT:
A method and an apparatus capable of stripping resist efficiently in a short amount of time. A stripping solution under high pressure is jetted from a nozzle to a rotating wafer. The resist layer on the wafer is applied with the jetted stripping solution, and the resist layer can be efficiently stripped in a short amount of time by the multiplied effect by the physical effect caused by the impact of the jetted stripping solution and the chemical effect of the stripping solution.

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McGraw-Hill Dictionary of Scientific and Technical Terms, fourth edition (1989) pp. 41, 739 and 1012.
IBM Tech. Disclosure Bulletin vol. 36, Issue No. 4, pp 223-224, Apr. 1993.
IBM Tech. Disclosure Bulletin vol. 30, Issue No. 4, pp 10, Jan. 1988.

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