Resist stripping method and apparatus

Details Resist stripping method and apparatus Resist stripping method and apparatus

2005-07-05

2005-07-05

Stinson, Frankie L. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Work handled in bulk or groups

C134S034000, C134S037000, C134S033000

Reexamination Certificate

active

06913027

ABSTRACT:
A method and an apparatus capable of stripping resist efficiently in a short amount of time. A stripping solution under high pressure is jetted from a nozzle to a rotating wafer. The resist layer on the wafer is applied with the jetted stripping solution, and the resist layer can be efficiently stripped in a short amount of time by the multiplied effect by the physical effect caused by the impact of the jetted stripping solution and the chemical effect of the stripping solution.

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