Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Reexamination Certificate
2008-08-15
2011-12-13
Olsen, Allan (Department: 1716)
Cleaning and liquid contact with solids
Processes
Using sequentially applied treating agents
C134S034000, C134S036000, C216S083000, C438S745000, C438S749000
Reexamination Certificate
active
08075702
ABSTRACT:
In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric acid from the substrate surface.
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Dainippon Screen Mfg. Co,. Ltd.
Olsen Allan
Ostrolenk Faber LLP
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