Resist removing method and resist removing apparatus

Details Resist removing method and resist removing apparatus Resist removing method and resist removing apparatus

2006-08-25

2008-09-23

Deo, Duy-Vu N (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

C156S345150, C156S345170, C156S345210, C156S345220

Reexamination Certificate

active

07427333

ABSTRACT:
In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric acid from the substrate surface.

REFERENCES:
patent: 5634980 (1997-06-01), Tomita et al.
patent: 6726848 (2004-04-01), Hansen et al.
patent: 6878303 (2005-04-01), Okamoto
patent: 6979655 (2005-12-01), Niuya et al.
patent: 2005/0072525 (2005-04-01), Pancham et al.
patent: 2005/0178401 (2005-08-01), Boyers
patent: 2005/0242062 (2005-11-01), Sakurai et al.
patent: 2005-93926 (2005-04-01), None
patent: 10-0274078 (1994-10-01), None
patent: 1996-0042993 (1996-12-01), None
Office Action issued Sep. 19, 2007 in connection with the Korean Application No. 10-2006-0079448.

Affiliated with

Also associated with

Rating

Resist removing method and resist removing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist removing method and resist removing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist removing method and resist removing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3983421