Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1975-06-09
1977-05-10
Esposito, Michael F.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 43, 427 44, 427 82, 427 96, 427259, 427273, 427335, 427336, 96 36, 96 362, B05D 304, B05D 312
Patent
active
040229327
ABSTRACT:
The method for making patterned resist masks having minimum opening dimensions. The mask is prepared initially using standard photo or electron beam lithography techniques to yield the smallest aperture dimensions consistent with the state-of-the-art. Then, the resulting mask is placed within a chamber containing an atmosphere of resist solvent vapor. The vapor is absorbed by the patterned resist mask causing controlled resist reflow which uniformly reduces the dimensions of the resist openings by an amount determined by time, temperature, resist thickness, resist type and solvent used.
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patent: 2294479 (1942-09-01), Peter
patent: 3339526 (1967-09-01), Bradley
patent: 3539381 (1970-11-01), Kayarian
patent: 3597257 (1971-08-01), Dunn
patent: 3737499 (1973-06-01), Kaming
Galindo et al., IBM TDB, vol, 13, No. 5, (10-1970), p. 1266, Method of Photoresist Appl.
Esch et al., IBM TDB, vol. 16, No. 6, (11-1973), Rheology...by Spin, pp. 1730-1731.
Esposito Michael F.
Haase Robert J.
International Business Machines - Corporation
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