Resist processing system

Details Resist processing system Resist processing system

1998-05-22

1999-11-16

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

422255, 553501, 55472, 396565, G03D 500, G03F 730, H01L 2170, B01D 3501

Patent

active

059845414

ABSTRACT:
A resist processing system comprising a resist processing chamber 11, an air filter 14 and an air intake unit 15 for introducing air into the processing chamber 11 through the air filter 14, the air filter 14 having a housing 18 and a diffusion scrubber 19 separating a first space and a second space within the housing 18, the first space having a liquid inlet port 21A and a liquid outlet port 21B for passing a liquid therethrough, the second space having an air inlet port 20A and an air outlet port 20B for passing the air from the air intake unit therethrough.

Affiliated with

Also associated with

Rating

Resist processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist processing system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1315662