Coating apparatus – With means to centrifuge work
Patent
1997-09-02
1999-10-26
Edwards, Laura
Coating apparatus
With means to centrifuge work
118 58, 118 66, 118 69, 118500, 118319, 118320, 414222, 414225, 414935, 414937, 414941, B05C 500
Patent
active
059721103
ABSTRACT:
A resist processing system includes a plurality of processing units each having a plurality of compartments stacked one upon the other in a vertical direction, a solution processing device arranged in a compartment positioned in a lower portion of the processing unit for applying a process solution to a substrate W while rotating the substrate, a heating device arranged in a compartment positioned in an upper portion of the processing unit for heating the substrate, a cooling device arranged in an intermediate compartment positioned between the compartment having the heating device arranged therein and the compartment having the solution processing device arranged therein for cooling the substrate, and a main arm mechanism arranged in each of the processing units and provided with a plurality of holders for transferring the substrate W into and out of each compartment, the holder being movable into and out of each of the compartments included in the processing unit, movable in a Z-axis direction, and swingable about the Z-axis by an angle .theta..
REFERENCES:
patent: 5297910 (1994-03-01), Yoshioka et al.
patent: 5620560 (1997-04-01), Akimoto et al.
patent: 5639301 (1997-06-01), Sasada et al.
patent: 5779799 (1998-07-01), Davis
Patent Abstracts of Japan, vol. 94, JP 06-163392, Jun. 10, 1994.
Edwards Laura
Tokyo Electron Limited
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