Resist processing apparatus

Details Resist processing apparatus Resist processing apparatus

1995-12-26

2000-03-07

Bushey, C. Scott

Coating apparatus

Projection or spray type

Rotating work

95 47, 96 6, 96 8, 96 10, B01D 1900

Patent

active

060334754

ABSTRACT:
The present invention has a resist processing apparatus for supplying a processing solution onto an object to be processed to perform a resist process, including a processing solution supply nozzle for supplying the processing solution onto the object to be processed, a processing solution feeding arrangement for feeding the processing solution to the processing solution supply nozzle, a processing solution flow path arranged to extend between the processing solution feeding arrangement and the processing solution supply nozzle, and a processing solution deaeration mechanism arranged at an intermediate portion of the processing solution flow path to deaerate the processing solution. The processing solution deaeration mechanism includes a closed vessel, an inlet port for introducing the processing solution into the closed vessel, a member arranged in the closed vessel and having a gas-liquid separation function, and an evacuating arrangement for evacuating the interior of the closed vessel to deaerate the processing solution through the member having the gas-liquid separation function. Gaseous components are separated from the processing solution, and an outlet port feeds the processing solution, from which gaseous components are separated by the member having the gas-liquid separation function, to the processing solution supply nozzle.

REFERENCES:
patent: 4622239 (1986-11-01), Schoenthaler et al.
patent: 4787921 (1988-11-01), Shibata et al.
patent: 5019140 (1991-05-01), Bowser et al.
patent: 5134962 (1992-08-01), Amada et al.
patent: 5374312 (1994-12-01), Hasebe et al.
patent: 5425803 (1995-06-01), van Schravendijk et al.

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