Resist process apparatus

Details Resist process apparatus Resist process apparatus

1989-11-28

1991-10-29

Werner, Frank E.

Material or article handling

Apparatus for charging a load holding or supporting element...

Load holding or supporting element including gripping means

118500, 1984686, 294 32, 414749, 901 16, 901 30, B25T 502

Patent

active

050611445

ABSTRACT:
A resist process apparatus of the invention serves to load/unload a semiconductor wafer in/from the respective process mechanisms. The apparatus includes a wafer holding member for holding a semiconductor wafer, and X, Y, Z and .theta. driving mechanisms for conveying the wafer holding member to a resist coating mechanism and the like. The wafer holding member includes a support frame which is larger than diameter of a semiconductor wafer, and a plurality of support members, arranged on the support frame, for supporting the semiconductor wafer in partial contact with the peripheral portion of the semiconductor wafer. Since the contact area between the support members and a semiconductor wafer is small, changes in temperature of the semiconductor, when it is held, are small.

REFERENCES:
patent: 4311427 (1982-01-01), Coad et al.
patent: 4433951 (1984-02-01), Koch et al.
patent: 4507078 (1985-03-01), Tam et al.
patent: 4632624 (1986-12-01), Mirkovich et al.
patent: 4722298 (1988-02-01), Rubin et al.
patent: 4936328 (1990-06-01), Yatabe

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