Resist process

Details Resist process Resist process

1973-05-03

1976-01-06

Powell, William A.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

156 12, 156 17, 427 82, 427 96, 427259, G03C 500

Patent

active

039308570

ABSTRACT:
A resist mask, whose configuration is changed during processing, is formed by varying the exposure energy across a resist layer and then conducting successive development steps using developers having increasing solvent power to remove progressively more of the resist layer with each step.

REFERENCES:
patent: 3152938 (1964-10-01), Osifchin et al.
patent: 3458311 (1969-07-01), Alles
patent: 3535137 (1970-10-01), Haller et al.
patent: 3600243 (1971-08-01), LaRocque et al.
patent: 3649393 (1972-03-01), Hatzakis
patent: 3730717 (1973-05-01), Fu Hua Chu et al.
patent: 3756827 (1973-09-01), Teh-Lin Chang
IBM Technical Disclosure Bulletin, "Polymer Patterns", Levi et al., Vol. 10, No. 7, Dec. 1967, p. 867.

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