Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2009-03-30
2010-10-26
Mathews, Alan A (Department: 2882)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S027000, C396S611000
Reexamination Certificate
active
07821616
ABSTRACT:
In immersion exposure, a resist pattern forming method suppressing resist pattern defects comprises mounting a substrate formed a resist film thereon and a reticle formed a pattern thereon onto an exposure apparatus, supplying a first chemical solution onto the resist film to selectively form a first liquid film in a local area on the resist film and draining the solution, the first liquid film having a flow and being formed between the resist film and a projection optical system, transferring the pattern of the reticle to the resist film through the first liquid film to form a latent image, supplying a second chemical solution onto the resist film to clean the resist film, heating the resist film, and developing the resist film to form a resist pattern from the resist film.
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Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Mathews Alan A
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