Resist materials

Details Resist materials Resist materials

1992-01-24

1993-04-06

Brust, Joseph Paul

Organic compounds -- part of the class 532-570 series

Organic compounds

Sulfonate esters

558 47, 558 54, 558 56, 558 58, 558413, C07C30919, C07C30906, C07C25550

Patent

active

052005445

ABSTRACT:
A class of resist compositions sensitive to deep ultraviolet radiation includes a resin sensitive to acid and a composition that generates acid upon exposure to such radiation. A group of nitrobenzyl materials is particularly suitable for use as the acid generator.

REFERENCES:
patent: 1646785 (1925-06-01), Duisberg et al.
patent: 3840579 (1974-10-01), Fan
patent: 3978228 (1976-08-01), Yoshinaga et al.
patent: 4310471 (1982-01-01), Oswald et al.
Aldrich Chemical Catalog, (1992), title page and p. 1228. Aldrich Chem. Co. Inc., 1001 West Saint Paul Ave. Milwaukee, Wis. 53233.
March, "Advanced Organic Chemistry", 3rd ed., p. 312 (date not available), John Wiley & Sons, A Wiley Interscience Publications; New York Chichester, Brisbane, Toronto, Singapore.

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